The ConeMist ultrasonic spray nozzle is an ultrasonic atomizing nozzle with a cyclonic cone spray shape. It is based on ultrasonic atomizing nozzle technology and adopts a special vortex air flow channel to distribute the carrier gas into a uniform vortex, so that the liquid mist after ultrasonic atomization is scattered and spurted in the form of a cyclone, as enlarges the spraying area of the ultrasonic spray nozzle. It is better for spraying onto the surface with micro structures such as MEMs and is able to make the coating layer with better coverage on the surface structure.
Depending on the advantage of ConeMist ultrasonic nozzle, a typical application of a ConeMist ultrasonic spray nozzle is photoresist coating on semiconductor wafer or MEMs device. Compared with spin coating, the photoresist layer coated by Siansonic ConeMist ultrasonic nozzle has the advantages of higher uniformity, better coverage on microstructures and capability of thinner coating thickness. In addition, the ConeMist ultrasonic nozzle can also be applied to other applications such as thin film solar cell, perovskite solar cell, AR anti-reflective layer, hydrophobic coating, PCB fluxing, etc.
Features of Siansonic ConeMist ultrasonic spray nozzle:
Spray width: 40-150mm
Uniformity > 95%
Vortex spray shape: better for the substrate with microstructure
Save raw materials: the utilization rate of raw materials is more than 85%, 4 times that of traditional air spray nozzle
Precisely control of coating thickness: typical coating thickness is 20nm to 100μm
The maximum flow rate can be more than 80ml/min
Small and uniform droplets
Capable of intermittent or continuous spray
New energy: fuel cells, electrolysis, thin film solar cells, etc.
Biomedical: functional coatings of microfluidic chips, biosensors
Electronics and semiconductors: photoresists, conductive inks, transparent conductive oxides, etc.
Glass coating: AR anti-reflection, hydrophilic and hydrophobic coating, hard protective coating, etc.