Shower type megasonic nozzle sprays the liquid with sound energy onto the substrate such as wafer. Compared to batch type megasonic cleaning, it can provide higher transfer efficiency of megasonic power. In addition, the wafer surface can acquire more uniform megasonic energy field.
The batch type megasonic plate can be easily assembled into process tank to build a batch type megasonic cleaning system for wafers. By using special coupling technique, piezoelectric transducer precisely matches with quartz or sapphire vibration layer to efficiently emit uniform sound field into the process tank.
Cover type megasonic cleaning is an optimized meagsonic cleaning technology which has the advantages of both batch type and shower type megasonic cleaning and removes the drawbacks of both types.
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